Table of Contents
Sharp's exclusive Plasmacluster technology generates and releases positive and negative ions similar to those found in nature, eliminating mold, viruses, and other harmful substances in the air.
Plasmacluster ions are surrounded by water molecules and released into the air. The OH radical ions will experience a strong oxidation reaction when attached to the surfaces of particles in this environment, such as allergens, bacteria, molds, and viruses. They break down the protein structure by removing the H atom from the surface, then combining it with the H atom to form water (H20), which is left in the air.
Process of PLASMACLUSTER ION technology
Unleash the PLASMACLUSTER ION
Plasmacluster ions have similar features to the negative and positive ions found in nature. The released ions survive in the air as they will be surrounded by standard water molecules, increasing the lift up to 1100mm.
Defeat bacteria in the air
The highly oxidizing OH radical ions will adhere to the surfaces of molds and bacteria. They will break down the protein structure by removing the H atom on the surface of the standard protein structures, increasing the lift up to 1100 mm.
Regenerate the composition of water molecules in the air
The radical (OH) will combine with (H) to form water (H2O) in the standard air, increasing the lift up to 1100mm.
